Application

11784073 · CONTROLLING THE CHARACTERISTICS OF IMPLANTER ION-BEAMS

Filed 2007-04-05 · Granted · Patent 7351984 (2008-04-01) The official file ↗The patent and its PDF ↗ · Art unit 2881 · Examiner James J Leybourne · CPC H01J 37/141 · Varian Semiconductor Equipment Associates, Inc.

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

5.0 mo

to disposition 11.9 mo

Statutes raised

0 actions read

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