PATLY.AIApplication
12385064 · RESIST PATTERN FORMING METHOD, SEMICONDUCTOR APPARATUS USING SAID METHOD, AND EXPOSURE APPARATUS THEREOF
Filed 2009-03-30 · Granted · Patent 7821616 (2010-10-26) The official file ↗The patent and its PDF ↗ · Art unit 2882 · Examiner Alan A Mathews Easy · CPC G03F 7/70341 · KIOXIA CORPORATION · FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER
Office actions
1
first was Non-final rejection
RCEs
0
no appeal
To first action
10.0 mo
to disposition 18.9 mo
Statutes raised
102 103
1 actions read