PATLY.AIApplication
12841313 · TECHNIQUE FOR COMPENSATING FOR A DIFFERENCE IN DEPOSITION BEHAVIOR IN AN INTERLAYER DIELECTRIC MATERIAL
Filed 2010-07-22 · Granted · Patent 7875514 (2011-01-25) The official file ↗The patent and its PDF ↗ · Art unit 2813 · Examiner Aaron J Staniszewski Hard · CPC H10D 84/0167 · TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED · Advanced Micro Devices, Inc.
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