Application

13070702 · SELF-ALIGNED SILICIDE FORMATION ON SOURCE/DRAIN THROUGH CONTACT VIA

Filed 2011-03-24 · Granted · Patent 8349718 (2013-01-08) The official file ↗The patent and its PDF ↗ · Art unit 2896 · Examiner Wai Sing Louie Easy · CPC H10D 30/794 · KABUSHIKI KAISHA TOSHIBA · Gregory Turocy

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

13.3 mo

to disposition 21.6 mo

Statutes raised

0 actions read

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