PATLY.AIApplication
13223906 · GAS CLUSTER ION BEAM ETCHING PROCESS FOR ACHIEVING TARGET ETCH PROCESS METRICS FOR MULTIPLE MATERIALS
Filed 2011-09-01 · Granted · Patent 8512586 (2013-08-20) The official file ↗The patent and its PDF ↗ · Art unit 1713 · Examiner David Y Kaufman Hard · CPC H10P 50/00 · GEOPIER FOUNDATION COMPANY, INC. · WOOD, HERRON & EVANS, LLP (TOKYO ELECTRON)
Office actions
1
first was Non-final rejection
RCEs
0
no appeal
To first action
13.7 mo
to disposition 23.6 mo
Statutes raised
102 103
1 actions read