Application

13278202 · RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN

Filed 2011-10-21 · Abandoned The official file ↗ · Art unit 1722 · Examiner Connie P Johnson Hard · CPC G03F 7/0045 · JSR CORPORATION · DITTHAVONG, STEINER, & MLOTKOWSKI

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

17.1 mo

to disposition 23.7 mo

Statutes raised

102 103

1 actions read

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