Application

13566069 · Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen

Filed 2012-08-03 · Granted · Patent 8563443 (2013-10-22) The official file ↗The patent and its PDF ↗ · Art unit 2891 · Examiner Asok K Sarkar Easy · CPC H10P 14/6339 · ASM JAPAN K.K. · Snell & Wilmer (ASM IP Holding B.V.)

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

12.8 mo

to disposition 14.6 mo

Statutes raised

0 actions read

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