Application

13586602 · POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

Filed 2012-08-15 · Granted · Patent 8652756 (2014-02-18) The official file ↗The patent and its PDF ↗ · Art unit 1722 · Examiner Connie P Johnson Hard · CPC G03F 1/00 · SHIN-ETSU CHEMICAL CO., LTD. · OLIFF PLC

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

14.1 mo

to disposition 18.1 mo

Statutes raised

0 actions read

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