Application

13977314 · MAGNETRON SOURCE, MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHOD

Filed 2013-06-28 · Granted · Patent 9399817 (2016-07-26) The official file ↗The patent and its PDF ↗ · Art unit 1756 · Examiner Rodney Glenn McDonald Typical · CPC C23C 14/35 · BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. · Troutman Pepper Locke LLP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

32.1 mo

to disposition 36.9 mo

Statutes raised

112

1 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.