Application

14601550 · PHOTORESIST AND POST ETCH RESIDUE CLEANING SOLUTION

Filed 2015-01-21 · Abandoned The official file ↗ · Art unit 1761 · Examiner Gregory R Delcotto Hard · CPC H01L 21/02041 · Dynaloy, LLC · LEE & HAYES, P.C.

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

1.1 mo

to disposition 24.1 mo

Statutes raised

103 112 DP

4 actions read

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