Application

14823956 · SOFT POLISHING PAD FOR POLISHING A SEMICONDUCTOR SUBSTRATE

Filed 2015-08-11 · Abandoned The official file ↗ · Art unit 3723 · Examiner Joel Dillon Crandall Typical · CPC H10P 52/00 · NexPlanar Corporation · Thomas Omholt

Office actions

first was Non-final rejection

RCEs

appealed

To first action

11.5 mo

to disposition 62.1 mo

Statutes raised

102 103 112

6 actions read

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