Application

14853574 · METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

Filed 2015-09-14 · Granted · Patent 9551931 (2017-01-24) The official file ↗The patent and its PDF ↗ · Art unit 1722 · Examiner Amanda C Walke Easy · CPC C08F 220/26 · FUJIFILM CORPORATION · SUGHRUE MION, PLLC

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

6.7 mo

to disposition 16.4 mo

Statutes raised

103 112

1 actions read

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