Application

14854784 · OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT

Filed 2015-09-15 · Granted · Patent 10690812 (2020-06-23) The official file ↗The patent and its PDF ↗ · Art unit 2872 · Examiner Robert E Tallman Typical · CPC G02B 1/14 · ASML Netherlands B.V. · EDELL, SHAPIRO & FINNAN, LLC

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

33.7 mo

to disposition 57.3 mo

Statutes raised

102 103

3 actions read

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