Application

14883762 · MULTI-LINE WIDTH PATTERN CREATED USING PHOTOLITHOGRAPHY

Filed 2015-10-15 · Granted · Patent 9733570 (2017-08-15) The official file ↗The patent and its PDF ↗ · Art unit 1722 · Examiner Kathleen Duda Easy · CPC G03F 7/40 · Taiwan Semiconductor Manufacturing Company Limited · Jones Day

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

11.4 mo

to disposition 22.0 mo

Statutes raised

103 112 DP

2 actions read

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