Application

15018207 · SYSTEMS AND METHODS FOR IN SITU MAINTENANCE OF A THIN HARDMASK DURING AN ETCH PROCESS

Filed 2016-02-08 · Granted · Patent 10157752 (2018-12-18) The official file ↗The patent and its PDF ↗ · Art unit 2822 · Examiner Kevin M Picardat Easy · CPC H10P 50/73 · Taiwan Semiconductor Manufacturing Company, Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

3.2 mo

to disposition 34.3 mo

Statutes raised

103 DP

3 actions read

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