Application

15137740 · WAFER WITH IMPROVED PLATING CURRENT DISTRIBUTION

Filed 2016-04-25 · Granted · Patent 9627317 (2017-04-18) The official file ↗The patent and its PDF ↗ · Art unit 2891 · Examiner Tucker J Wright Typical · CPC H10W 20/43 · GLOBALFOUNDRIES Inc. · GLOBALFOUNDRIES INC.

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

8.2 mo

to disposition 11.8 mo

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.