Application

15158073 · METHOD TO FORM DUAL CHANNEL SEMICONDUCTOR MATERIAL FINS

Filed 2016-05-18 · Granted · Patent 9786666 (2017-10-10) The official file ↗The patent and its PDF ↗ · Art unit 2818 · Examiner David Vu Easy · CPC H10D 84/853 · International Business Machines Corporation · INACTIVE - POU IPLAW

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

8.0 mo

to disposition 16.8 mo

Statutes raised

102

1 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.