Application

15180641 · SYSTEM AND METHOD TO DETERMINE DEPTH FOR OPTICAL WAFER INSPECTION

Filed 2016-06-13 · Granted · Patent 9989479 (2018-06-05) The official file ↗The patent and its PDF ↗ · Art unit 2886 · Examiner Jamil Ahmed Typical · CPC G01N 21/9505 · KLA-Tencor Corporation · KLA-Tencor Corporation and Simpson & Simpson PLLC

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

13.3 mo

to disposition 23.7 mo

Statutes raised

101 103 DP

1 actions read

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