Application

15189117 · SEMICONDUCTOR DEVICES HAVING SOURCE/DRAIN REGIONS WITH STRAIN-INDUCING LAYERS AND METHODS OF MANUFACTURING SUCH SEMICONDUCTOR DEVICES

Filed 2016-06-22 · Granted · Patent 9553192 (2017-01-24) The official file ↗The patent and its PDF ↗ · Art unit 2817 · Examiner David Nhu Easy · CPC H10D 30/6757 · Samsung Electronics Co., Ltd. · MYERS BIGEL, P.A.

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

3.0 mo

to disposition 7.1 mo

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.