PATLY.AIApplication
15291538 · ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Filed 2016-10-12 · Granted · Patent 10261417 (2019-04-16) The official file ↗The patent and its PDF ↗ · Art unit 1722 · Examiner Amanda C Walke Easy · CPC G03F 7/0397 · FUJIFILM Corporation · SUGHRUE MION, PLLC
Office actions
2
first was Non-final rejection
RCEs
1
no appeal
To first action
10.3 mo
to disposition 30.1 mo
Statutes raised
102 103 112
2 actions read