Application

15341240 · FINFET SPACER FORMATION ON GATE SIDEWALLS, BETWEEN THE CHANNEL AND SOURCE/DRAIN REGIONS

Filed 2016-11-02 · Granted · Patent 9806078 (2017-10-31) The official file ↗The patent and its PDF ↗ · Art unit 2898 · Examiner Mary A Wilczewski Typical · CPC H10D 84/853 · GLOBALFOUNDRIES Inc. · Heslin Rothenberg Farley & Mesiti/ GlobalFoundries

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

6.7 mo

to disposition 11.9 mo

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.