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Application

15417846 · MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING MASK BLANK SUBSTRATE, METHOD OF MANUFACTURING SUBSTRATE WITH REFLECTIVE FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

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Filed 2017-01-27 · Granted · Patent 10025176 (2018-07-17) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Stephen D Rosasco Easy · CPC G03F 1/60 · HOYA CORPORATION · SUGHRUE MION, PLLC

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first was Notice of allowance
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To first action
14.2 mo
to disposition 17.6 mo
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