Application

15620699 · LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE

Filed 2017-06-12 · Abandoned The official file ↗ · Art unit 2882 · Examiner Deoram Persaud Typical · CPC G01B 9/02027 · Mapper Lithography IP B.V. · WOMBLE BOND DICKINSON (US) LLP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

11.7 mo

to disposition 18.5 mo

Statutes raised

103 DP

1 actions read

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