Application

15681102 · Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features

Filed 2017-08-18 · Granted · Patent 10468244 (2019-11-05) The official file ↗The patent and its PDF ↗ · Art unit 1765 · Examiner Kuo Liang Peng Easy · CPC H10P 14/6682 · Versum Materials US, LLC · Versum Materials US LLC

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

16.7 mo

to disposition 26.6 mo

Statutes raised

101 102 112

1 actions read

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