Application

15692087 · METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WAFERS

Filed 2017-08-31 · Granted · Patent 10474033 (2019-11-12) The official file ↗The patent and its PDF ↗ · Art unit 2852 · Examiner Rodney Evan Fuller Typical · CPC H10P 72/0432 · Applied Materials, Inc. · PATTERSON & SHERIDAN, LLP - - APPLIED MATERIALS

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

18.2 mo

to disposition 26.4 mo

Statutes raised

102 DP

1 actions read

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