Application

15739824 · POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS

Filed 2017-12-26 · Granted · Patent 10331045 (2019-06-25) The official file ↗The patent and its PDF ↗ · Art unit 2882 · Examiner Hung Nguyen Easy · CPC G03F 7/70775 · ASML NETHERLANDS B.V. · Pillsbury Winthrop Shaw Pittman, LLP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

10.1 mo

to disposition 17.9 mo

Statutes raised

102

1 actions read

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