Application

15797676 · Substrate Vapor Drying Apparatus and Method

Filed 2017-10-30 · Granted · Patent 11133200 (2021-09-28) The official file ↗The patent and its PDF ↗ · Art unit 1714 · Examiner Douglas Lee Typical · CPC H10P 72/0402 · Taiwan Semiconductor Manufacturing Co., Ltd. · TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

20.1 mo

to disposition 46.9 mo

Statutes raised

102 103

2 actions read

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