PATLY.AIApplication
15820108 · ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRITICAL DIMENSION CONTROL
Filed 2017-11-21 · Granted · Patent 10734238 (2020-08-04) The official file ↗The patent and its PDF ↗ · Art unit 1713 · Examiner Binh X Tran Typical · CPC H10P 50/244 · Lam Research Corporation · WEAVER AUSTIN VILLENEUVE & SAMPSON - LAMR/NOVL
Office actions
2
first was Restriction requirement
RCEs
0
no appeal
To first action
15.6 mo
to disposition 32.4 mo
Statutes raised
102 103 112
2 actions read