Application

16218614 · Systems and Methods for in SITU Maintenance of a Thin Hardmask During an Etch Process

Filed 2018-12-13 · Granted · Patent 11024515 (2021-06-01) The official file ↗The patent and its PDF ↗ · Art unit 2822 · Examiner Michael Manh Trinh Typical · CPC H10P 50/73 · Taiwan Semiconductor Manufacturing Company, Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

11.9 mo

to disposition 29.6 mo

Statutes raised

102 103 112

3 actions read

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