Application

16222064 · PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS

Filed 2018-12-17 · Granted · Patent 12234369 (2025-02-25) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Daborah Chacko Davis Typical · CPC C09D 133/02 · Rohm and Haas Electronic Materials LLC · DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC

Office actions

first was Non-final rejection

RCEs

appealed

To first action

17.7 mo

to disposition 74.3 mo

Statutes raised

112

4 actions read

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