Application

16494768 · PLASMA CHEMICAL VAPOR DEPOSITION REACTOR WITH A MICROWAVE RESONANT CAVITY

Filed 2019-09-17 · Granted · Patent 11270869 (2022-03-08) The official file ↗The patent and its PDF ↗ · Art unit 1716 · Examiner Rakesh Kumar Dhingra Typical · CPC H01J 37/32256 · TAIYUAN UNIVERSITY OF TECHNOLOGY · Lei Yu

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

17.3 mo

to disposition 29.7 mo

Statutes raised

103 112

1 actions read

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