Application

16527420 · RESIST COMPOSITION AND PATTERNING PROCESS

Filed 2019-07-31 · Granted · Patent 10649332 (2020-05-12) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Cynthia Hamilton Typical · CPC G03F 7/0392 · Shin-Etsu Chemical Co., Ltd. · WHDA, LLP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

3.4 mo

to disposition 9.4 mo

Statutes raised

1 actions read

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