Application

16569746 · PLANARIZING RDLS IN RDL-FIRST PROCESSES THROUGH CMP PROCESS

Filed 2019-09-13 · Granted · Patent 10714414 (2020-07-14) The official file ↗The patent and its PDF ↗ · Art unit 2811 · Examiner Yosef Gebreyesus Typical · CPC H10W 90/701 · Taiwan Semiconductor Manufacturing Company, Ltd. · Intellectual Property Division

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

5.6 mo

to disposition 10.0 mo

Statutes raised

0 actions read

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