Application

16821444 · Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture

Filed 2020-03-17 · Granted · Patent 11022876 (2021-06-01) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner John A McPherson Easy · CPC G03F 1/24 · Applied Materials, Inc. · SERVILLA WHITNEY LLC/AMT

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

5.3 mo

to disposition 14.5 mo

Statutes raised

1 actions read

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