Application

16983369 · METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH METAL SILICIDE LAYER

Filed 2020-08-03 · Granted · Patent 11101354 (2021-08-24) The official file ↗The patent and its PDF ↗ · Art unit 2894 · Examiner David E Graybill Typical · CPC H10D 64/01 · Taiwan Semiconductor Manufacturing Co., Ltd. · BIRCH STEWART KOLASCH & BIRCH, LLP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

1.9 mo

to disposition 12.7 mo

Statutes raised

101 112 DP

2 actions read

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