Application

16983523 · Method of Using A Surfactant-Containing Shrinkage Material to Prevent Photoresist Pattern Collapse Caused by Capillary Forces

Filed 2020-08-03 · Granted · Patent 11086221 (2021-08-10) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Kathleen Duda Easy · CPC H10F 39/011 · Taiwan Semiconductor Manufacturing Co., Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

2.5 mo

to disposition 12.2 mo

Statutes raised

1 actions read

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