PATLY.AIApplication
17092282 · MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
Filed 2020-11-08 · Granted · Patent 11366395 (2022-06-21) The official file ↗The patent and its PDF ↗ · Art unit 2882 · Examiner Hung Nguyen Easy · CPC G03F 7/70316 · Carl Zeiss SMT GmbH · EDELL, SHAPIRO & FINNAN, LLC
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