Application

17097921 · Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

Filed 2020-11-13 · Granted · Patent 11079682 (2021-08-03) The official file ↗The patent and its PDF ↗ · Art unit 1716 · Examiner Roberts P Culbert Easy · CPC G03F 7/0043 · Tokyo Electron Limited · Tokyo Electron U.S. Holdings, Inc.

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

4.6 mo

to disposition 8.6 mo

Statutes raised

0 actions read

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