Application

17127298 · ION IMPLANTATION TO FORM TRENCH-BOTTOM OXIDE OF MOSFET

Filed 2020-12-18 · Granted · Patent 11695060 (2023-07-04) The official file ↗The patent and its PDF ↗ · Art unit 2826 · Examiner Fazli Erdem Typical · CPC H10D 30/0297 · Applied Materials, Inc. · KDW Firm PLLC - Varian/Applied Materials (85525)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

23.6 mo

to disposition 30.5 mo

Statutes raised

102

1 actions read

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