Application

17176263 · PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

Filed 2021-02-16 · Abandoned The official file ↗ · Art unit 1737 · Examiner John S Y Chu Typical · CPC G03F 7/0042 · CORNELL UNIVERSITY · Element IP, PLC

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

24.2 mo

to disposition 46.7 mo

Statutes raised

102 103

3 actions read

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