Application

17187059 · Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing

Filed 2021-02-26 · Granted · Patent 11482450 (2022-10-25) The official file ↗The patent and its PDF ↗ · Art unit 1713 · Examiner Lan Vinh Typical · CPC H10W 20/062 · Taiwan Semiconductor Manufacturing Co., Ltd. · TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

11.0 mo

to disposition 19.9 mo

Statutes raised

102 103 112

1 actions read

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