Application

17263539 · COMPACT HIGH DENSITY PLASMA SOURCE

Filed 2021-01-26 · Granted · Patent 12198896 (2025-01-14) The official file ↗The patent and its PDF ↗ · Art unit 1718 · Examiner Joshua Nathaniel Pi Reyes Typical · CPC H01J 37/3211 · Lam Research Corporation · PENILLA IP, APC and Lam Research Corp.

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

21.8 mo

to disposition 47.6 mo

Statutes raised

103

4 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.