Application

17277027 · LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE

Filed 2021-03-17 · Granted · Patent 12078934 (2024-09-03) The official file ↗The patent and its PDF ↗ · Art unit 2881 · Examiner David A Vanore Easy · CPC G03F 7/70133 · ASML Netherlands B.V. · ASML CIP (San Diego) / DMIPG

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

29.6 mo

to disposition 41.6 mo

Statutes raised

102 112

2 actions read

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