Application

17468536 · METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WAFERS

Filed 2021-09-07 · Granted · Patent 11899366 (2024-02-13) The official file ↗The patent and its PDF ↗ · Art unit 1716 · Examiner Jeffrie Robert Lund Easy · CPC H10P 72/0432 · Applied Materials, Inc. · PATTERSON & SHERIDAN, LLP - - APPLIED MATERIALS

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

25.0 mo

to disposition 29.2 mo

Statutes raised

0 actions read

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