Application

17541877 · METHOD AND APPARATUS FOR REMOVING PARTICLES FROM THE SURFACE OF A SEMICONDUCTOR WAFER

Filed 2021-12-03 · Granted · Patent 11688600 (2023-06-27) The official file ↗The patent and its PDF ↗ · Art unit 1711 · Examiner Cristi J Tate-Sims Easy · CPC H10P 70/20 · NCC NANO, LLC · STINSON LLP

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

8.1 mo

to disposition 18.8 mo

Statutes raised

102 103

1 actions read

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