Application

17583799 · SYSTEM FOR MONITORING A PLASMA

Filed 2022-01-25 · Granted · Patent 12171053 (2024-12-17) The official file ↗The patent and its PDF ↗ · Art unit 2881 · Examiner Hanway Chang Typical · CPC H05G 2/0027 · ASML Netherlands B.V. · ASML CIP (San Diego) / DMIPG

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

27.0 mo

to disposition 34.7 mo

Statutes raised

1 actions read

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