PATLY.AIApplication
17596928 · APPARATUS FOR PHOTORESIST DRY DEPOSITION
Filed 2021-12-21 · Abandoned The official file ↗ · Art unit 1716 · Examiner Laureen Chan Typical · CPC G03F 7/16 · Lam Research Corporation · WEAVER AUSTIN VILLENEUVE & SAMPSON - LAMR/NOVL
Office actions
3
first was Non-final rejection
RCEs
1
no appeal
To first action
21.9 mo
to disposition 39.7 mo
Statutes raised
102 103
3 actions read