Application

17818571 · FIN HEIGHT AND STI DEPTH FOR PERFORMANCE IMPROVEMENT IN SEMICONDUCTOR DEVICES HAVING HIGH-MOBILITY P-CHANNEL TRANSISTORS

Filed 2022-08-09 · Granted · Patent 12563828 (2026-02-24) The official file ↗The patent and its PDF ↗ · Art unit 2899 · Examiner Andre C Stevenson Typical · CPC H10D 84/853 · Taiwan Semiconductor Manufacturing Co., Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

24.3 mo

to disposition 42.5 mo

Statutes raised

2 actions read

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