Application

17834758 · SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

Filed 2022-06-07 · Abandoned The official file ↗ · Art unit 1718 · Examiner Benjamin R Kendall Typical · CPC H10P 72/7612 · TOKYO ELECTRON LIMITED · Weihrouch IP

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

4.4 mo

to disposition 16.6 mo

Statutes raised

103 112

2 actions read

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