Application

17835521 · PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Filed 2022-06-08 · Granted · Patent 11721522 (2023-08-08) The official file ↗The patent and its PDF ↗ · Art unit 1713 · Examiner Shamim Ahmed Typical · CPC H10P 50/283 · TOKYO ELECTRON LIMITED · Weihrouch IP

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

9.4 mo

to disposition 14.0 mo

Statutes raised

0 actions read

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